IMN

Biblio. IMN

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Avella, M., Jimenez, J., Pommereau, F., Landesman, J.-P. & Rhallabi, A. (2008) Introduction of defects during the dry etching of InP photonic structures: a cathodo-luminescence study. J. Mater. Sci.-Mater. Electron. 19 S171–S175.   
Added by: Laurent Cournède 2016-03-10 21:58:40 Pop. 0.5%
Bouchoule, S., Chanson, R., Pageau, A., Cambril, E., Guilet, S., Rhallabi, A. & Cardinaud, C. (2015) Surface chemistry of InP ridge structures etched in Cl-2-based plasma analyzed with angular XPS. J. Vac. Sci. Technol. A, 33 05E124.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.75%
Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C. & Landesman, J. P. (2013) Modeling of inductively coupled plasma Ar/Cl-2/N-2 plasma discharge: Effect of N-2 on the plasma properties. J. Vac. Sci. Technol. A, 31 011301.   
Added by: Laurent Cournède 2016-03-10 21:23:32 Pop. 0.5%
Chanson, R., Rhallabi, A., Fernandez, M. C. & Cardinaud, C. (2013) Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution. Plasma Process. Polym. 10 213–224.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 0.5%
Chanson, R., Bouchoule, S., Cardinaud, C., Petit-Etienne, C., Cambril, E., Rhallabi, A., Guilet, S. & Blanquet, E. (2014) X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl-2-based inductively coupled plasma. J. Vac. Sci. Technol. B, 32 011219.   
Added by: Florent Boucher 2016-04-29 09:26:45 Pop. 0.5%
Cosson, M., David, B., Arzel, L., Poizot, P. & Rhallabi, A. (2022) Modelling of photovoltaic production and electrochemical storage in an autonomous solar drone. eScience, 2 235–241.   
Last edited by: Richard Baschera 2022-06-16 09:39:27 Pop. 10.5%
Dain, G. L., Laourine, F., Guilet, S., Czerwiec, T., Marcos, G., Noel, C., Henrion, G., Cardinaud, C., Girard, A. & Rhallabi, A. (2021) Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma. Plasma Sources Science and Technology, 30 095022.   
Last edited by: Richard Baschera 2021-10-25 15:13:56 Pop. 1.75%
Haidar, Y., Pateau, A., Rhallabi, A., Fernandez, M. C., Mokrani, A., Taher, F., Roqueta, F. & Boufnichel, M. (2014) SF6 and C4F8 global kinetic models coupled to sheath models. Plasma Sources Sci. Technol. 23 065037.   
Added by: Laurent Cournède 2016-03-10 21:01:54 Pop. 0.75%
Haidar, Y., Rhallabi, A., Pateau, A., Mokrani, A., Taher, F., Roqueta, F. & Boufnichel, M. (2016) Simulation of cryogenic silicon etching under SF6/O-2/Ar plasma discharge. J. Vac. Sci. Technol. A, 34 061306.   
Last edited by: Richard Baschera 2017-02-02 13:42:02 Pop. 0.75%
Hannade, Y., Taher, F., Haidar, Y. & Rhallabi, A. (2019) Theoretical study of the electronic structure of mono-bromide of lanthanum molecule including spin-orbit coupling effects. Journal of Molecular Modeling, 25 250.   
Last edited by: Richard Baschera 2019-08-22 14:29:04 Pop. 0.5%
Lallement, L., Rhallabi, A., Cardinaud, C. & Fernandez, M. C. P. (2011) Modelling of fluorine based high density plasma for the etching of silica glasses. J. Vac. Sci. Technol. A, 29 051304.   
Added by: Laurent Cournède 2016-03-10 21:32:20 Pop. 0.5%
Landesman, J.-P., Jimenez, J., Levallois, C., Pommereau, F., Frigeri, C., Torres, A., Leger, Y., Beck, A. & Rhallabi, A. (2016) Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells. Journal of Vacuum Science & Technology A, 34 041304.   
Last edited by: Richard Baschera 2016-08-24 13:40:11 Pop. 0.75%
Le Dain, G., Rhallabi, A., Girard, A., Cardinaud, C., Roqueta, F. & Boufnichel, M. (2019) Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties. Plasma Sources Science & Technology, 28 085002.   
Last edited by: Richard Baschera 2019-08-23 13:36:25 Pop. 0.75%
Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109.   
Last edited by: Richard Baschera 2018-07-24 12:58:27 Pop. 0.75%
Le Dain, G., Rhallabi, A., Fernandez, M. C., Boufnichel, M. & Roqueta, F. (2017) Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process. Journal of Vacuum Science & Technology A, 35 03E113.   
Last edited by: Richard Baschera 2017-07-07 14:56:51 Pop. 0.5%
Pateau, A., Rhallabi, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2014) Modeling of inductively coupled plasma SF6/O-2/Ar plasma discharge: Effect of O-2 on the plasma kinetic properties. J. Vac. Sci. Technol. A, 32 021303.   
Added by: Florent Boucher 2016-04-29 09:26:44 Pop. 0.5%
Rammal, M., Rhallabi, A., Neel, D., Make, D., Shen, A. & Djouadi, A. (2019) AlN Etching under ICP Cl-2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model. Mrs Advances, 4 1579–1587.   
Last edited by: Richard Baschera 2019-07-17 09:52:59 Pop. 0.5%
Salimy, S., Goullet, A., Rhallabi, A., Challali, F., Toutain, S. & Saubat, J. C. (2011) A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis. Solid-State Electron. 61 38–45.   
Added by: Laurent Cournède 2016-03-10 21:32:20 Pop. 0.5%
Zerrouki, A., Yousfi, M., Rhallabi, A., Motomura, H. & Jinno, M. (2016) Monte Carlo Poration Model of Cell Membranes for Application to Plasma Gene Transfection. Plasma Processes and Polymers, 13 633–648.   
Last edited by: Richard Baschera 2016-08-24 13:23:10 Pop. 0.75%
Zgheib, J., Jouan, P. Y. & Rhallabi, A. (2021) A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions. Journal of Vacuum Science & Technology A, 39 043004.   
Last edited by: Richard Baschera 2021-07-02 13:54:32 Pop. 1.75%
wikindx 4.2.2 ©2014 | Références totales : 2608 | Requêtes métadonnées : 106 | Exécution de script : 0.22955 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale