IMN

Biblio. IMN

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Abdallah, B., Chala, A., Jouan, P. .-Y., Besland, M. P. & Djouadi, M. A. (2007) Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias. Thin Solid Films, 515 7105–7108.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.5%
Abdallah, B., Duquenne, C., Besland, M. P., Gautron, E., Jouan, P. Y., Tessier, P. Y., Brault, J., Cordier, Y. & Djouadi, M. A. (2008) Thickness and substrate effects on AlN thin film growth at room temperature. Eur. Phys. J.-Appl. Phys, 43 309–313.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.5%
Begou, T., Beche, B., Landesman, J. P., Gaviot, E., Soussou, A., Makaoui, K., Besland, M. P., Granier, A. & Goullet, A. (2008) Integrated optics based on plasma processed dielectric materials. Kruschwitz, J. D. T. & Ellison, M. J. (Eds.), Advances in Thin-Film Coatings for Optical Applications V Bellingham.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.5%
Besland, M. P., Aissa, H. D. A., Barroy, P. R. J., Lafane, S., Tessier, P. Y., Angleraud, B., Richard-Plouet, M., Brohan, L. & Djouadi, M. A. (2006) Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition. Thin Solid Films, 495 86–91.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.25%
Besland, M. P., Borderon, C., Barroy, P. R. J., Le Tacon, S., Richard-Plouet, M., Averty, D., Tessier, P. Y., Gundel, H. W., Brohan, L. & Djouadi, M. A. (2008) Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering - art. no. 012006. Finnis, M. W., Hoffmann, M. J. & GautierSoyer, M. (Eds.), Interfacial Nanostructures in Ceramics: A Multiscale Approach Bristol.   
Last edited by: Richard Baschera 2016-11-30 15:17:41 Pop. 0.5%
Besland, M. P., Borderon, C., Cavellier, M., Le Tacon, S., Richard-Plouet, M., Albertini, D., Averty, D., Tessier, P. Y., Gundel, H. W., Brohan, L. & Djouadi, M. A. (2007) Two step reactive magnetron sputtering of BLT thin films. Integr. Ferroelectr. 94 94–104.   
Added by: Laurent Cournède 2016-03-10 22:02:31 Pop. 0.75%
Challali, F., Besland, M. P., Benzeggouta, D., Borderon, C., Hugon, M. C., Salimy, S., Saubat, J. C., Charpentier, A., Averty, D., Goullet, A. & Landesman, J. P. (2010) Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon. Thin Solid Films, 518 4619–4622.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 0.25%
Diener, P., Janod, E., Corraze, B., Querre, M., Adda, C., Guilloux-Viry, M., Cordier, S., Camjayi, A., Rozenberg, M., Besland, M. P. & Cario, L. (2018) How a dc Electric Field Drives Mott Insulators Out of Equilibrium. Physical Review Letters, 121 016601.   
Last edited by: Richard Baschera 2018-07-24 14:25:21 Pop. 0.5%
Dubosc, M., Minea, T., Besland, M. P., Cardinaud, C., Granier, A., Gohier, A., Point, S. & Torres, J. (2006) Low temperature plasma carbon nanotubes growth on patterned catalyst. Microelectron. Eng. 83 2427–2431.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.25%
Duquenne, C., Djouadi, M. A., Tessier, P. Y., Jouan, P. Y., Besland, M. P., Brylinski, C., Aubry, R. & Delage, S. (2008) Epitaxial growth of aluminum nitride on AlGaN by reactive sputtering at low temperature. Appl. Phys. Lett. 93 052905.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.5%
Duquenne, C., Tessier, P. Y., Besland, M. P., Angleraud, B., Jouan, P. Y., Aubry, R., Delage, S. & Djouadi, M. A. (2008) Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films. J. Appl. Phys. 104 063301.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.5%
Han, J., Fu, G., Krishnakumar, V., Liao, C., Jaegermann, W. & Besland, M. P. (2013) Preparation and characterization of ZnS/CdS bi-layer for CdTe solar cell application. J. Phys. Chem. Solids, 74 1879–1883.   
Added by: Laurent Cournède 2016-03-10 21:23:29 Pop. 0.25%
Han, J.-F., Fu, G.-H., Krishnakumar, V., Schimper, H.-J., Liao, C., Jaegermann, W. & Besland, M. P. (2015) Studies of CdS/CdTe interface: Comparison of CdS films deposited by close space sublimation and chemical bath deposition techniques. Thin Solid Films, 582 290–294.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.25%
Jun-feng, H., Liu, X., Li-mei, C., Hamon, J. & Besland, M. P. (2015) Investigation of oxide layer on CdTe film surface and its effect on the device performance. Mater. Sci. Semicond. Process, 40 402–406.   
Added by: Laurent Cournède 2016-03-10 18:36:40 Pop. 0.25%
Liu, C. E., Richard-Plouet, M., Albertini, D., Besland, M. P. & Brohan, L. (2008) Bi3.25La0.75Ti3O12 films on La2Ti2O7 thin films prepared by chemical solution deposition - art. no. 012014. Finnis, M. W., Hoffmann, M. J. & GautierSoyer, M. (Eds.), Interfacial Nanostructures in Ceramics: A Multiscale Approach Bristol.   
Last edited by: Richard Baschera 2016-11-30 15:17:09 Pop. 0.5%
Mitronika, M., Villeneuve-Faure, C., Massol, F., Boudou, L., Ravisy, W., Besland, M. P., Goullet, A. & Richard-Plouet, M. (2021) TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties. Applied Surface Science, 541 148510.   
Last edited by: Richard Baschera 2021-02-12 09:48:29 Pop. 1.25%
Point, S., Minea, T., Besland, M. P. & Granier, A. (2006) Characterization of carbon nanotubes and carbon nitride nanofibres synthesized by PECVD. Eur. Phys. J.-Appl. Phys, 34 157–163.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.25%
Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Pairis, S., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2012) Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range. J. Appl. Phys. 112 094104.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.25%
Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2013) Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect. J. Phys. D-Appl. Phys. 46 065308.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 0.25%
Rouahi, A., Challali, F., Dakhlaoui, I., Vallee, C., Salimy, S., Jomni, F., Yangui, B., Besland, M. P., Goullet, A. & Sylvestre, A. (2016) Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications. Thin Solid Films, 606 127–132.   
Last edited by: Richard Baschera 2016-06-03 13:58:09 Pop. 0.5%
Sanchez, G., Abdallah, B., Tristant, P., Dublanche-Tixier, C., Djouadi, M. A., Besland, M. P., Jouan, P. Y. & Bologna Alles, A. (2009) Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition. J. Mater. Sci. 44 6125–6134.   
Added by: Laurent Cournède 2016-03-10 21:41:23 Pop. 0.25%
Tranchant, J., Angleraud, B., Tessier, P. Y., Besland, M. P., Landesman, J. P. & Djouadi, M. A. (2006) Residual stress control in MoCr thin films deposited by ionized magnetron sputtering. Surf. Coat. Technol. 200 6549–6553.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.25%
wikindx 4.2.2 ©2014 | Références totales : 2525 | Requêtes métadonnées : 117 | Exécution de script : 0.23002 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale