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Antoun, G., Tillocher, T., Girard, A., Lefaucheux, P., Faguet, J., Kim, H., Zhang, D., Wang, M., Maekawa, K., Cardinaud, C. & Dussart, R. (2022) Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O-2 and Ar plasmas. Journal of Vacuum Science & Technology A, 40.   
Last edited by: Richard Baschera 2022-10-17 15:19:39 Pop. 1.75%
Avval, T. G., Gallagher, N., Morgan, D., Bargiela, P., Fairley, N., Fernandez, V. & Linford, M. R. (2022) Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). I. Introduction to methods useful for large or complex datasets. Journal of Vacuum Science & Technology A, 40 063206.   
Last edited by: Richard Baschera 2022-12-14 13:28:52 Pop. 4.75%
Avval, T. G., Haack, H., Gallagher, N., Morgan, D., Bargiela, P., Fairley, N., Fernandez, V. & Linford, M. R. (2022) Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid. Journal of Vacuum Science & Technology A, 40 063205.   
Last edited by: Richard Baschera 2022-12-14 13:28:05 Pop. 5%
Fairley, N., Bargiela, P., Roberts, A., Fernandez, V. & Baltrusaitis, J. (2023) Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example. Journal of Vacuum Science & Technology A, 41 013203.   
Last edited by: Richard Baschera 2023-01-20 09:57:54 Pop. 7.5%
Landesman, J.-P., Jimenez, J., Levallois, C., Pommereau, F., Frigeri, C., Torres, A., Leger, Y., Beck, A. & Rhallabi, A. (2016) Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells. Journal of Vacuum Science & Technology A, 34 041304.   
Last edited by: Richard Baschera 2016-08-24 13:40:11 Pop. 0.25%
Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109.   
Last edited by: Richard Baschera 2018-07-24 12:58:27 Pop. 0.5%
Le Dain, G., Rhallabi, A., Fernandez, M. C., Boufnichel, M. & Roqueta, F. (2017) Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process. Journal of Vacuum Science & Technology A, 35 03E113.   
Last edited by: Richard Baschera 2017-07-07 14:56:51 Pop. 0.25%
Major, G. H., Fernandez, V., Fairley, N., Smith, E. F. & Linford, M. R. (2022) Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting. Journal of Vacuum Science & Technology A, 40.   
Last edited by: Richard Baschera 2022-11-14 10:07:58 Pop. 2%
Major, G. H., Fairley, N., Sherwood, P. M. A., Linford, M. R., Terry, J., Fernandez, V. & Artyushkova, K. (2020) Practical guide for curve fitting in x-ray photoelectron spectroscopy. Journal of Vacuum Science & Technology A, 38 061203.   
Last edited by: Richard Baschera 2020-11-17 13:22:05 Pop. 0.5%
Piet, J., Faider, W., Girard, A., Boulard, F. & Cardinaud, C. (2020) Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas. Journal of Vacuum Science & Technology A, 38 053005.   
Last edited by: Richard Baschera 2020-11-17 13:38:54 Pop. 0.5%
Reed, B. P., Cant, D. J. H., Spencer, S. J., Carmona-Carmona, A. J., Bushell, A., Herrera-Gomez, A., Kurokawa, A., Thissen, A., Thomas, A. G., Britton, A. J. & Fernandez, V. (2020) Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene. Journal of Vacuum Science & Technology A, 38 063208.   
Last edited by: Richard Baschera 2021-01-11 08:26:44 Pop. 0.5%
Vallee, C., Bonvalot, M., Belahcen, S., Yeghoyan, T., Jaffal, M., Vallat, R., Chaker, A., Lefèvre, G., David, S., Bsiesy, A., Posseme, N., Gassilloud, R. & Granier, A. (2020) Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition. Journal of Vacuum Science & Technology A, 38 033007.   
Last edited by: Richard Baschera 2020-05-15 08:31:27 Pop. 0.75%
Zgheib, J., Jouan, P. Y. & Rhallabi, A. (2021) A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions. Journal of Vacuum Science & Technology A, 39 043004.   
Last edited by: Richard Baschera 2021-07-02 13:54:32 Pop. 0.75%
wikindx 4.2.2 ©2014 | Références totales : 2699 | Requêtes métadonnées : 81 | Exécution de script : 0.10579 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale