IMN

Biblio. IMN

Liste de références

Affichage de 1 - 8 de 8 (Bibliographie: Bibliographie WIKINDX globale)
Paramètres :
Collection:  Journal of Vacuum Science & Technology A
Ordonner par

Croissant
Décroissant
Utiliser tout ce qui est coché 
Utiliser tout ce qui est affiché 
Utiliser tous les items 
Landesman, J.-P., Jimenez, J., Levallois, C., Pommereau, F., Frigeri, C., Torres, A., Leger, Y., Beck, A. & Rhallabi, A. (2016) Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells. Journal of Vacuum Science & Technology A, 34 041304.   
Last edited by: Richard Baschera 2016-08-24 13:40:11 Pop. 0.5%
Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109.   
Last edited by: Richard Baschera 2018-07-24 12:58:27 Pop. 0.5%
Le Dain, G., Rhallabi, A., Fernandez, M. C., Boufnichel, M. & Roqueta, F. (2017) Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process. Journal of Vacuum Science & Technology A, 35 03E113.   
Last edited by: Richard Baschera 2017-07-07 14:56:51 Pop. 0.5%
Major, G. H., Fairley, N., Sherwood, P. M. A., Linford, M. R., Terry, J., Fernandez, V. & Artyushkova, K. (2020) Practical guide for curve fitting in x-ray photoelectron spectroscopy. Journal of Vacuum Science & Technology A, 38 061203.   
Last edited by: Richard Baschera 2020-11-17 13:22:05 Pop. 0.75%
Piet, J., Faider, W., Girard, A., Boulard, F. & Cardinaud, C. (2020) Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas. Journal of Vacuum Science & Technology A, 38 053005.   
Last edited by: Richard Baschera 2020-11-17 13:38:54 Pop. 0.75%
Reed, B. P., Cant, D. J. H., Spencer, S. J., Carmona-Carmona, A. J., Bushell, A., Herrera-Gomez, A., Kurokawa, A., Thissen, A., Thomas, A. G., Britton, A. J. & Fernandez, V. (2020) Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene. Journal of Vacuum Science & Technology A, 38 063208.   
Last edited by: Richard Baschera 2021-01-11 08:26:44 Pop. 1%
Vallee, C., Bonvalot, M., Belahcen, S., Yeghoyan, T., Jaffal, M., Vallat, R., Chaker, A., Lefèvre, G., David, S., Bsiesy, A., Posseme, N., Gassilloud, R. & Granier, A. (2020) Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition. Journal of Vacuum Science & Technology A, 38 033007.   
Last edited by: Richard Baschera 2020-05-15 08:31:27 Pop. 1%
Zgheib, J., Jouan, P. Y. & Rhallabi, A. (2021) A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions. Journal of Vacuum Science & Technology A, 39 043004.   
Last edited by: Richard Baschera 2021-07-02 13:54:32 Pop. 1.5%
wikindx 4.2.2 ©2014 | Références totales : 2559 | Requêtes métadonnées : 61 | Exécution de script : 0.09609 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale