Begou, T., Beche, B., Goullet, A., Landesman, J. P., Granier, A., Cardinaud, C., Gaviot, E., Camberlein, L., Grossard, N., Jezequel, G. & Zyss, J. (2007) First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides. Opt. Mater. 30 657–661. |
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Begou, T., Beche, B., Grossard, N., Zyss, J., Goullet, A., Jezequel, G. & Gaviot, E. (2008) Marcatili's extended approach: comparison to semi-vectorial methods applied to pedestal waveguide design. J. Opt. A-Pure Appl. Opt. 10 055310. |
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Begou, T., Becheb, B., Goullet, A., Granier, A., Cardinaud, C., Gaviot, E., Raballand, V., Landesman, J. P. & Zyss, J. (2006) Photonics integrated circuits on plasma-polymer-HMDSO: Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers. Iecon 2006 - 32nd Annual Conference on Ieee Industrial Electronics, Vols 1-11 New York. |
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Belkerk, B. E., Soussou, M. A., Carette, M., Djouadi, M. A. & Scudeller, Y. (2012) Measuring thermal conductivity of thin films and coatings with the ultra-fast transient hot-strip technique. J. Phys. D-Appl. Phys. 45 295303. |
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Belkerk, B. E., Soussou, A., Carette, M., Djouadi, M. A. & Scudeller, Y. (2012) Structural-dependent thermal conductivity of aluminium nitride produced by reactive direct current magnetron sputtering. Appl. Phys. Lett. 101 151908. |
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Added by: Laurent Cournède 2016-03-10 21:28:38 |
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Belmahi, M., Bulou, S., Thouvenin, A., de Poucques, L., Hugon, R., Le Brizoual, L., Miska, P., Geneve, D., Vasseur, J.-L. & Bougdira, J. (2014) Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H-2/N-2/Ar/Hexamethyldisilazane Gas Mixture. Plasma Process. Polym. 11 551–558. |
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Added by: Laurent Cournède 2016-03-10 21:01:56 |
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Bernede, J. C., Houari, S., Nguyen, D., Jouan, P. Y., Khelil, A., Mokrani, A., Cattin, L. & Predeep, P. (2012) XPS study of the band alignment at ITO/oxide (n-type MoO3 or p-type NiO) interface. Phys. Status Solidi A-Appl. Mat. 209 1291–1297. |
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Bertaud, T., Bermond, C., Challali, F., Goullet, A., Vallee, C. & Flechet, B. (2011) Ultra wide band frequency characterization of integrated TiTaO-based metal-insulator-metal devices. J. Appl. Phys. 110 044110. |
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Besland, M. P., Borderon, C., Barroy, P. R. J., Le Tacon, S., Richard-Plouet, M., Averty, D., Tessier, P. Y., Gundel, H. W., Brohan, L. & Djouadi, M. A. (2008) Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering - art. no. 012006. Finnis, M. W., Hoffmann, M. J. & GautierSoyer, M. (Eds.), Interfacial Nanostructures in Ceramics: A Multiscale Approach Bristol. |
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Besland, M. P., Aissa, H. D. A., Barroy, P. R. J., Lafane, S., Tessier, P. Y., Angleraud, B., Richard-Plouet, M., Brohan, L. & Djouadi, M. A. (2006) Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition. Thin Solid Films, 495 86–91. |
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Besland, M. P., Borderon, C., Cavellier, M., Le Tacon, S., Richard-Plouet, M., Albertini, D., Averty, D., Tessier, P. Y., Gundel, H. W., Brohan, L. & Djouadi, M. A. (2007) Two step reactive magnetron sputtering of BLT thin films. Integr. Ferroelectr. 94 94–104. |
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Added by: Laurent Cournède 2016-03-10 22:02:31 |
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Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, P., Laffon, C., Angleraud, B., Tessier, P. Y. & Minea, T. M. (2009) Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR. Diam. Relat. Mat. 18 1091–1097. |
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Added by: Laurent Cournède 2016-03-10 21:41:23 |
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Bouchoule, S., Chanson, R., Pageau, A., Cambril, E., Guilet, S., Rhallabi, A. & Cardinaud, C. (2015) Surface chemistry of InP ridge structures etched in Cl-2-based plasma analyzed with angular XPS. J. Vac. Sci. Technol. A, 33 05E124. |
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Added by: Laurent Cournède 2016-03-10 18:36:41 |
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Bouchoule, S., Vallier, L., Patriarche, G., Chevolleau, T. & Cardinaud, C. (2012) Effect of Cl-2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy. J. Vac. Sci. Technol. A, 30 031301. |
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Boulard, F., Baylet, J. & Cardinaud, C. (2009) Effect of Ar and N-2 addition on CH4-H-2 based chemistry inductively coupled plasma etching of HgCdTe. J. Vac. Sci. Technol. A, 27 855–861. |
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Boulard, F., Baylet, J. & Cardinaud, C. (2010) Influence of Cadmium Composition on CH4-H-2-Based Inductively Coupled Plasma Etching of Hg1-x Cd (x) Te. J. Electron. Mater. 39 1256–1261. |
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Bouquet, V., Cario, L., Cordier, S., Guilloux-Viry, M., Querre, M., Corraze, B., Janod, E., Besland, M. P., Tranchant, J. & Potel, M. 2014. Electric Pulse Induced Resistive Switching in the Narrow Gap Mott Insulator GaMo4S8. Paper read at Inorganic and Environmental Materials. |
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Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51. |
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Bousquet, A., Bursikova, V., Goullet, A., Djouadi, A., Zajickova, L. & Granier, A. (2006) Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas. Surf. Coat. Technol. 200 6517–6521. |
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Bousquet, A., Goullet, A., Leteinturier, C., Coulon, N. & Granier, A. (2008) Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes. Eur. Phys. J.-Appl. Phys, 42 3–8. |
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Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002. |
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Bousquet, A., Cartry, G. & Granier, A. (2007) Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy. Plasma Sources Sci. Technol. 16 597–605. |
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Bouts, N., Gaillard, M., Donero, L., El Mel, A. A., Gautron, E., Angleraud, B., Boulmer-Leborgne, C. & Tessier, P. Y. (2017) Growth control of carbon nanotubes using nanocomposite nickel/carbon thin films. Thin Solid Films, 630 38–47. |
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Bouts, N., El Mel, A.-A., Angleraud, B. & Tessier, P.-Y. (2015) Sponge-like carbon thin films: The dealloying concept applied to copper/carbon nanocomposite. Carbon, 83 250–261. |
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Bouts, N., Angleraud, B., Ynsa, M. D., Humbert, B., Manso, M., El Mel, A.-A. & Tessier, P.-Y. (2017) Electrical behavior of nickel/carbon nanocomposite thin films. Carbon, 111 878–886. |
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Buffiere, M., Brammertz, G., El Mel, A.-A., Barreau, N., Meuris, M. & Poortmans, J. (2017) Effect of ammonium sulfide treatments on the surface properties of Cu2ZnSnSe4 thin films. Thin Solid Films, 633 135–140. |
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Buffiere, M., Brammertz, G., Sahayaraj, S., Batuk, M., Khelifi, S., Mangin, D., El Mel, A.-A., Arzel, L., Hadermann, J., Meuris, M. & Poortmans, J. (2015) KCN Chemical Etch for Interface Engineering in Cu2ZnSnSe4 Solar Cells. ACS Appl. Mater. Interfaces, 7 14690–14698. |
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Buffiere, M., El Mel, A.-A., Lenaers, N., Brammertz, G., Zaghi, A. E., Meuris, M. & Poortmans, J. (2015) Surface Cleaning and Passivation Using (NH4)(2)S Treatment for Cu(In,Ga)Se-2 Solar Cells: A Safe Alternative to KCN. Adv. Energy Mater. 5 1401689. |
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Added by: Laurent Cournède 2016-03-10 18:36:42 |
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Buffiere, M., Lepetit, T., Khelifi, S. & El Mel, A.-A. (2017) Interface Engineering in CuInSe2 Solar Cells Using Ammonium Sulfide Vapors. Solar Rrl, 1 UNSP 1700067. |
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Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture. Surf. Coat. Technol. 205 S214–S217. |
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Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Bougdira, J. & Belmahi, M. (2012) Wide variations of SiCxNy:H thin films optical constants deposited by H-2/N-2/Ar/hexamethyldisilazane microwave plasma. Surf. Coat. Technol. 208 46–50. |
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Bulou, S., Le Brizoual, L., Hugon, R., De Poucques, L., Belmahi, M., Migeon, H.-N. & Bougdira, J. (2009) Characterization of a N-2/CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition. Plasma Process. Polym. 6 S576–S581. |
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Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma. Thin Solid Films, 520 245–250. |
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Cardinaud, C. (2018) Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment. Comptes Rendus Chimie, 21 723–739. |
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Last edited by: Richard Baschera 2019-01-04 11:16:35 |
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Carette, X., Debievre, B., Cornil, D., Cornil, J., Leclere, P., Maes, B., Gautier, N., Gautron, E., El Mel, A.-A., Raquez, J.-M. & Konstantinidis, S. (2018) On the Sputtering of Titanium and Silver onto Liquids, Discussing the Formation of Nanoparticles. J. Phys. Chem. C, 122 26605–26612. |
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Last edited by: Richard Baschera 2018-12-20 08:54:52 |
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Cemin, F., Girard, A. & Cardinaud, C. (2023) On the low temperature limits for cryogenic etching: A quasi in situ XPS study. Applied Surface Science, 637 157941. |
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Last edited by: Richard Baschera 2023-08-24 08:51:17 |
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Chala, A., Nouveau, C., Djouadi, M. A., Steyer, P., Millet, J. P., Saied, C., Aida, M. S. & Lambertin, M. (2006) Effect of duplex treatments by plasma nitriding and triode sputtering on corrosion behaviour of 32CDV13 low alloy steel. Surf. Coat. Technol. 200 6568–6571. |
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Challali, F., Mendil, D., Touam, T., Chauveau, T., Bockelee, V., Sanchez, A. G., Chelouche, A. & Besland, M.-P. (2020) Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration. Materials Science in Semiconductor Processing, 118 105217. |
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Last edited by: Richard Baschera 2020-11-17 14:10:25 |
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Challali, F., Touam, T., Bockelee, V., Chauveau, T., Chelouche, A., Stephant, N., Hamon, J. & Besland, M.-P. (2023) Comprehensive characterization of Al-doped ZnO thin films deposited in confocal radio frequency magnetron co-sputtering. Thin Solid Films, 780 139947. |
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Last edited by: Richard Baschera 2023-08-17 13:24:40 |
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Challali, F., Besland, M. P., Benzeggouta, D., Borderon, C., Hugon, M. C., Salimy, S., Saubat, J. C., Charpentier, A., Averty, D., Goullet, A. & Landesman, J. P. (2010) Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon. Thin Solid Films, 518 4619–4622. |
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Added by: Laurent Cournède 2016-03-10 21:37:32 |
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