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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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| Tranchant, J., Angleraud, B., Tessier, P. Y., Besland, M. P., Landesman, J. P. & Djouadi, M. A. (2006) Residual stress control in MoCr thin films deposited by ionized magnetron sputtering. Surf. Coat. Technol. 200 6549–6553. |
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| Tranchant, J., Tessier, P. Y., Landesman, J. P., Djouadi, M. A., Angleraud, B., Renault, P. O., Girault, B. & Goudeau, P. (2008) Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering. Surf. Coat. Technol. 202 2247–2251. |
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| Tranchant, J., Janod, E., Corraze, B., Stoliar, P., Rozenberg, M., Besland, M.-P. & Cario, L. (2015) Control of resistive switching in AM(4)Q(8) narrow gap Mott insulators: A first step towards neuromorphic applications. Phys. Status Solidi A-Appl. Mat. 212 239–244. |
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| Tsougeni, K., Vourdas, N., Tserepi, A., Gogolides, E. & Cardinaud, C. (2009) Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces. Langmuir, 25 11748–11759. |
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| Added by: Laurent Cournède 2016-03-10 21:41:23 |
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| Valero, A., Mery, A., Gaboriau, D., Dietrich, M., Fox, M., Chretien, J., Pauc, N., Jouan, P. Y., Gentile, P. & Sadki, S. (2021) Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 389 138727. |
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| Last edited by: Richard Baschera 2021-09-27 09:06:01 |
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| Vallee, C., Bonvalot, M., Belahcen, S., Yeghoyan, T., Jaffal, M., Vallat, R., Chaker, A., Lefèvre, G., David, S., Bsiesy, A., Posseme, N., Gassilloud, R. & Granier, A. (2020) Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition. Journal of Vacuum Science & Technology A, 38 033007. |
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| Verger, F., Nazabal, V., Colas, F., Nemec, P., Cardinaud, C., Baudet, E., Chahal, R., Rinnert, E., Boukerma, K., Peron, I., Deputier, S., Guilloux-Viry, M., Guin, J. P., Lhermite, H., Moreac, A., Compere, C. & Bureau, B. (2013) RF sputtered amorphous chalcogenide thin films for surface enhanced infrared absorption spectroscopy. Opt. Mater. Express, 3 2112–2131. |
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| Added by: Laurent Cournède 2016-03-10 21:23:29 |
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| Vermang, B., Brammertz, G., Meuris, M., Schnabel, T., Ahlswede, E., Choubrac, L., Harel, S., Cardinaud, C., Arzel, L., Barreau, N., van Deelen, J., Bolt, P.-J. & Bras, P. (2019) Wide band gap kesterite absorbers for thin film solar cells: potential and challenges for their deployment in tandem devices. Sustainable Energy & Fuels, 3 2246–2259. |
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| Last edited by: Richard Baschera 2019-09-18 08:16:49 |
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| Villeneuve-Faure, C., Mitronika, M., Dan, A. P., Boudou, L., Ravisy, W., Besland, M. P., Richard-Plouet, M. & Goullet, A. (2024) Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method. Nano Ex. 5 015010. |
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| Vlachopoulou, M.-E., Kokkoris, G., Cardinaud, C., Gogolides, E. & Tserepi, A. (2013) Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures. Plasma Process. Polym. 10 29–40. |
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| Added by: Laurent Cournède 2016-03-10 21:23:32 |
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| Zajickova, L., Bursikova, V., Franta, D., Bousquet, A., Granier, A., Goullet, A. & Bursik, J. (2007) Comparative Study of Films Deposited from HMDSO/O(2) in Continuous Wave and Pulsed rf Discharges. Plasma Process. Polym. 4 S287–S293. |
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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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| Zerrouki, A., Yousfi, M., Rhallabi, A., Motomura, H. & Jinno, M. (2016) Monte Carlo Poration Model of Cell Membranes for Application to Plasma Gene Transfection. Plasma Processes and Polymers, 13 633–648. |
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| Last edited by: Richard Baschera 2016-08-24 13:23:10 |
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| Zgheib, J., Berthelot, L., Tranchant, J., Ginot, N., Besland, M. .-P., Caillard, A., Minea, T., Rhallabi, A. & Jouan, P. .-Y. (2023) Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 41 063003. |
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| Last edited by: Richard Baschera 2023-11-22 08:53:13 |
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| Zgheib, J., Jouan, P. Y. & Rhallabi, A. (2021) A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions. Journal of Vacuum Science & Technology A, 39 043004. |
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| Last edited by: Richard Baschera 2021-07-02 13:54:32 |
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