| Rodriguez-Fano, M., Haydoura, M., Tranchant, J., Janod, E., Corraze, B., Jouan, P.-Y., Cario, L. & Besland, M.-P. (2023) Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1-xVx)2O3. ACS Appl. Mater. Interfaces, 15 54611–54621. |
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| Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Pairis, S., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2012) Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range. J. Appl. Phys. 112 094104. |
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| Rouahi, A., Challali, F., Dakhlaoui, I., Vallee, C., Salimy, S., Jomni, F., Yangui, B., Besland, M. P., Goullet, A. & Sylvestre, A. (2016) Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications. Thin Solid Films, 606 127–132. |
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| Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2013) Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect. J. Phys. D-Appl. Phys. 46 065308. |
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| Added by: Laurent Cournède 2016-03-10 21:23:31 |
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| Rupp, J. A. J., Corraze, B., Besland, M.-P., Cario, L., Tranchant, J., Wouters, D. J., Waser, R. & Janod, E. (2020) Control of stoichiometry and morphology in polycrystalline V(2)O(3)thin films using oxygen buffers. Journal of Materials Science, 55 14717–14727. |
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| Last edited by: Richard Baschera 2020-11-25 15:26:23 |
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| Rupp, J. A. J., Janod, E., Besland, M. .-P., Corraze, B., Kindsmüller, A., Querre, M., Tranchant, J., Cario, L., Dittmann, R., Waser, R. & Wouters, D. J. (2020) Competition between V2O3 phases deposited by one-step reactive sputtering process on polycrystalline conducting electrode. Thin Solid Films, 705 138063. |
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| Last edited by: Richard Baschera 2020-06-05 07:50:03 |
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| Rupp, J. A. J., Querre, M., Kindsmueller, A., Besland, M.-P., Janod, E., Dittmann, R., Waser, R. & Wouters, D. J. (2018) Different threshold and bipolar resistive switching mechanisms in reactively sputtered amorphous undoped and Cr-doped vanadium oxide thin films. Journal of Applied Physics, 123 044502. |
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| Last edited by: Richard Baschera 2018-02-16 08:30:30 |
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| Saied, C., Chala, A., Nouveau, C., Djouadi, M. A. & Chekour, L. (2007) Determination of the Optimum Conditions for Ion Nitriding of 32CDV13 Low Alloy Steel. Plasma Process. Polym. 4 S757–S760. |
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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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| Salah, F., Harzallah, B., van der Lee, A., Angleraud, B., Begou, T. & Granier, A. (2013) X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma. Thin Solid Films, 537 102–107. |
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| Added by: Laurent Cournède 2016-03-10 21:23:30 |
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| Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15. |
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| Added by: Laurent Cournède 2016-03-10 21:23:32 |
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| Salimy, S., Goullet, A., Rhallabi, A., Challali, F., Toutain, S. & Saubat, J. C. (2011) A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis. Solid-State Electron. 61 38–45. |
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| Added by: Laurent Cournède 2016-03-10 21:32:20 |
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| Sanchez, G., Abdallah, B., Tristant, P., Dublanche-Tixier, C., Djouadi, M. A., Besland, M. P., Jouan, P. Y. & Bologna Alles, A. (2009) Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition. J. Mater. Sci. 44 6125–6134. |
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| Added by: Laurent Cournède 2016-03-10 21:41:23 |
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| Sarakha, L., Begou, T., Goullet, A., Cellier, J., Bousquet, A., Tomasella, E., Sauvage, T., Boutinaud, P. & Mahiou, R. (2011) Influence of synthesis conditions on optical and electrical properties of CaTiO3:Pr3+ thin films deposited by radiofrequency sputtering for electroluminescent device. Surf. Coat. Technol. 205 S250–S253. |
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| Added by: Laurent Cournède 2016-03-10 21:32:20 |
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| Sarrazin, A., Posseme, N., Pimenta-Barros, P., Barnola, S., Gharbi, A., Argoud, M., Tiron, R. & Cardinaud, C. (2016) PMMA removal selectivity to polystyrene using dry etch approach. J. Vac. Sci. Technol. B, 34 061802. |
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| Last edited by: Richard Baschera 2017-02-02 13:48:42 |
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| Sarrazin, A., Posseme, N., Pimenta-Barros, P., Barnola, S., Tiron, R. & Cardinaud, C. (2019) New CH4-N-2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application. J. Vac. Sci. Technol. B, 37 030601. |
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| Last edited by: Richard Baschera 2019-11-29 12:41:07 |
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| Sarrazin, A., Pimenta-Barros, P., Posseme, N., Barnola, S., Gharbi, A., Argoud, M., Tiron, R. & Cardinaud, C. (2015) PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications. |
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| Last edited by: Richard Baschera 2018-03-07 11:37:08 |
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| Sarrazin, A., Posseme, N., Barros, P. P., Barnola, S., Claveau, G., Gharbi, A., Argoud, M., Chamiot-Maitral, G., Tiron, R., Nicolet, C., Navarro, C. & Cardinaud, C. (2016) PMMA removal selectivity to PS using dry etch approach: Sub-10nm patterning application. Lin, Q. & Engelmann, S. U. (Eds.), Advanced Etch Technology for Nanopatterning V Bellingham. |
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| Last edited by: Richard Baschera 2017-02-02 13:40:29 |
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| Sarrazin, A., Posseme, N., Pimenta-Barros, P., Barnola, S., Gharbi, A., Argoud, M., Tiron, R. & Cardinaud, C. (2018) Block copolymer selectivity: A new dry etch approach for cylindrical applications. Journal of Vacuum Science & Technology B, 36 041803. |
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| Last edited by: Richard Baschera 2018-08-20 09:24:00 |
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| Shahine, I., Hatte, Q., Harnois, M. & Tessier, P.-Y. (2024) Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Appl. Electron. Mater. |
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| Last edited by: Richard Baschera 2024-04-19 12:53:27 |
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| Shahine, I., Mevellec, J.-Y., Richard-Plouet, M., Humbert, B. & Tessier, P.-Y. (2022) Nanoporous Gold Stacked Layers as Substrates for SERS Detection in Liquids or Gases with Ultralow Detection Limits and Long-Term Stability. Journal of Physical Chemistry C, 126 17223–17233. |
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| Last edited by: Richard Baschera 2023-04-26 14:45:15 |
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| Shankar, S. K. V., Claveau, Y., Rasoanarivo, T., Ewels, C. & Bideau, J. L. (2024) Impact of Li, Na and Zn metal cation concentration in EMIM-TFSI ionic liquids on ion clustering, structure and dynamics. Phys. Chem. Chem. Phys. 26 7049–7059. |
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| Last edited by: Richard Baschera 2024-04-16 07:33:45 |
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| Smid, R., Granier, A., Bousquet, A., Cartry, G. & Zajickova, L. (2006) Study of magnetic field influence on charged species in a low pressure helicon reactor. Czech. J. Phys. 56 B1091–B1096. |
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| Soltani, A., BenMoussa, A., Touati, S., Hoel, V., De Jaeger, J. .-C., Laureyns, J., Cordier, Y., Marhic, C., Djouadi, M. A. & Dua, C. (2007) Development and analysis of low resistance ohmic contact to n-AlGaN/GaN HEMT. Diam. Relat. Mat. 16 262–266. |
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| Added by: Laurent Cournède 2016-03-10 22:02:31 |
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| Soltani, A., Talbi, A., Gerbedoen, J. .-C., De Jaeger, J. .-C., Pernod, P., Mortet, V. & Bassam, A. (2014) Theoretical and experimental investigation of Lamb waves characteristics in AlN/TiN and AlN/TiN/NCD composite membranes. 2014 Ieee International Ultrasonics Symposium (ius), 2047–2050. |
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| Added by: Florent Boucher 2016-04-29 09:26:45 |
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| Soucek, P., Schmidtova, T., Zabransky, L., Bursikova, V., Vasina, P., Caha, O., Jilek, M., El Mel, A. A., Tessier, P.-Y., Schaefer, J., Bursik, J., Perina, V. & Miksova, R. (2012) Evaluation of composition, mechanical properties and structure of nc-TiC/a-C:H coatings prepared by balanced magnetron sputtering. Surf. Coat. Technol. 211 111–116. |
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| Added by: Laurent Cournède 2016-03-10 21:28:38 |
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| Stoliar, P., Tranchant, J., Corraze, B., Janod, E., Besland, M.-P., Tesler, F., Rozenberg, M. & Cario, L. (2017) A Leaky-Integrate-and-Fire Neuron Analog Realized with a Mott Insulator. Adv. Funct. Mater. 27 1604740. |
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| Last edited by: Richard Baschera 2017-04-11 13:30:43 |
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| Stolz, A., Soltani, A., Abdallah, B., Charrier, J., Deresmes, D., Jouan, P. .-Y., Djouadi, M. A., Dogheche, E. & De Jaeger, J. .-C. (2013) Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy. Thin Solid Films, 534 442–445. |
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| Added by: Laurent Cournède 2016-03-10 21:23:31 |
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| Supiot, P., Vivien, C., Granier, A., Bousquet, A., Mackova, A., Escaich, D., Clergereaux, R., Raynaud, P., Stryhal, Z. & Pavlik, J. (2006) Growth and modification of organosilicon films in PECVD and remote afterglow reactors. Plasma Process. Polym. 3 100–109. |
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| Added by: Florent Boucher 2016-05-12 13:21:37 |
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| Tailleur, A., Achour, A., Djouadi, M. A., Le Brizoual, L., Gautron, E. & Tristant, P. (2012) PECVD low temperature synthesis of carbon nanotubes coated with aluminum nitride. Surf. Coat. Technol. 211 18–23. |
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| Added by: Laurent Cournède 2016-03-10 21:28:38 |
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| Tessier, P. Y., Issaoui, R., Luais, E., Boujtita, M., Granier, A. & Angleraud, B. (2009) Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon-metal nanocomposite thin films. Solid State Sci. 11 1824–1827. |
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| Added by: Laurent Cournède 2016-03-10 21:41:23 |
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| Tessier, P. Y. (2008) Current developments in ionised physical vapour deposition by magnetron sputtering - state of the art - prospects for the future in terms of applications. Surf. Eng. 24 319–321. |
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| Theelen, M., Harel, S., Verschuren, M., Tomassini, M., Hovestad, A., Barreau, N., van Berkum, J., Vroon, Z. & Zeman, M. (2016) Influence of Mo/MoSe2 microstructure on the damp heat stability of the Cu(In,Ga)Se2 back contact molybdenum. Thin Solid Films, 612 381–392. |
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| Last edited by: Richard Baschera 2016-09-28 09:37:16 |
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| Thiry, D., Molina-Luna, L., Gautron, E., Stephant, N., Chauvin, A., Du, K., Ding, J., Choi, C.-H., Tessier, P.-Y. & El Mel, A.-A. (2015) The Kirkendall Effect in Binary Alloys: Trapping Gold in Copper Oxide Nanoshells. Chem. Mat. 27 6374–6384. |
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| Added by: Laurent Cournède 2016-03-10 18:36:41 |
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| Thiry, D., Vinx, N., Damman, P., Aparicio, F. J., Tessier, P.-Y., Moerman, D., Leclere, P., Godfroid, T., Desprez, S. & Snyders, R. (2020) The wrinkling concept applied to plasma-deposited polymer-like thin films: A promising method for the fabrication of flexible electrodes. Plasma Process Polym, 17 2000119. |
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| Last edited by: Richard Baschera 2020-11-18 13:01:22 |
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| Thiry, D., Chauvin, A., El Mel, A.-A., Cardinaud, C., Hamon, J., Gautron, E., Stephant, N., Granier, A. & Tessier, P.-Y. (2017) Tailoring the chemistry and the nano-architecture of organic thin films using cold plasma processes. Plasma Processes and Polymers, 14 e1700042. |
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| Last edited by: Richard Baschera 2017-12-05 15:48:56 |
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| Thiry, D., Konstantinidis, S., Cornil, J. & Snyders, R. (2016) Plasma diagnostics for the low-pressure plasma polymerization process: A critical review. Thin Solid Films, 606 19–44. |
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| Last edited by: Richard Baschera 2016-06-03 13:59:57 |
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| Trahan, J., Profili, J., Robert-Bigras, G., Mitronika, M., Richard-Plouet, M. & Stafford, L. (2023) Optical response of plasmonic silver nanoparticles after treatment by a warm microwave plasma jet. Nanotechnology, 34 195701. |
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| Last edited by: Richard Baschera 2023-05-19 08:23:32 |
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| Tranchant, J., Tessier, P. Y., Landesman, J. P., Djouadi, M. A., Angleraud, B., Renault, P. O., Girault, B. & Goudeau, P. (2008) Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering. Surf. Coat. Technol. 202 2247–2251. |
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| Added by: Laurent Cournède 2016-03-10 21:58:42 |
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| Tranchant, J., Angleraud, B., Tessier, P. Y., Besland, M. P., Landesman, J. P. & Djouadi, M. A. (2006) Residual stress control in MoCr thin films deposited by ionized magnetron sputtering. Surf. Coat. Technol. 200 6549–6553. |
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| Added by: Florent Boucher 2016-05-12 13:21:37 |
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| Tranchant, J., Janod, E., Corraze, B., Stoliar, P., Rozenberg, M., Besland, M.-P. & Cario, L. (2015) Control of resistive switching in AM(4)Q(8) narrow gap Mott insulators: A first step towards neuromorphic applications. Phys. Status Solidi A-Appl. Mat. 212 239–244. |
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