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| Keraudy, J., Boyd, R. D., Shimizu, T., Helmersson, U. & Jouan, P. .-Y. (2018) Phase separation within NiSiN coatings during reactive HiPIMS discharges: A new pathway to grow NixSi nanocrystals composites at low temperature. Applied Surface Science, 454 148–156. |
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| Kovacevic, E., Hussain, S., Berndt, J., Pattyn, C., Strunskus, T., Ammar, M. R., Canizares, A., Simon, P., Tatarova, E., Dias, A., Tessier, P. Y. & Boulmer-Leborgne, C. (2017) Plasma Synthesis of Conductive Carbon Based Nanomaterials. Mascher, P. & Cvelbar, U. (Eds.), Plasma Nano Science and Technology. |
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| Last edited by: Richard Baschera 2017-10-24 13:37:03 |
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| Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M. .-C. & Rhallabi, A. (2010) Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. J. Vac. Sci. Technol. A, 28 277–286. |
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| Lallement, L., Rhallabi, A., Cardinaud, C. & Fernandez, M. C. P. (2011) Modelling of fluorine based high density plasma for the etching of silica glasses. J. Vac. Sci. Technol. A, 29 051304. |
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| Lambare, C., Tessier, P. .-Y., Poncin-Epaillard, F. & Debarnot, D. (2015) Plasma functionalization and etching for enhancing metal adhesion onto polymeric substrates. RSC Adv. 5 62348–62357. |
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| Added by: Laurent Cournède 2016-03-10 18:36:42 |
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| Lamkaouane, H., Ftouhi, H., Richard-Plouet, M., Gautier, N., Stephant, N., Zazoui, M., Addou, M., Cattin, L., Bernede, J. C., Mir, Y. & Louarn, G. (2022) Efficient and Facile Synthetic Route of MoO3:MoS2 Hybrid Thin Layer via Oxidative Reaction of MoS2 Nanoflakes. Nanomaterials, 12 3171. |
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| Last edited by: Richard Baschera 2022-11-03 14:36:39 |
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| Landesman, J.-P., Jimenez, J., Levallois, C., Pommereau, F., Frigeri, C., Torres, A., Leger, Y., Beck, A. & Rhallabi, A. (2016) Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells. Journal of Vacuum Science & Technology A, 34 041304. |
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| Landesman, J. P., Levallois, C., Jimenez, J., Pommereau, F., Leger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C. & Rhallabi, A. (2015) Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55 1750–1753. |
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| Le Bihan, F., Donero, L., Le Borgne, B., De Sagazan, O., Tessier, P.-Y., El Mel, A.-A., Kovacevic, E. & Le Brizoual, L. (2018) Dual-Gate TFT For Chemical Detection. Kuo, Y. (Ed.), Thin Film Transistor Technologies 14 (tftt 14). |
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| Le Borgne, B., Girard, A., Cardinaud, C., Salaun, A.-C., Pichon, L. & Geneste, F. (2018) Covalent functionalization of polycrystalline silicon nanoribbons applied to Pb(II) electrical detection. Sensors and Actuators B-Chemical, 268 368–375. |
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| Le Brizoual, L., Elmazria, O., Zhgoon, S., Soussou, A., Sarry, F. & Djouadi, M. A. (2010) AlN/ZnO/Diamond Waveguiding Layer Acoustic Wave Structure: Theoretical and Experimental Results. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 57 1818–1824. |
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| Le Brizoual, L., Elmazria, O., Zghoon, S., Soussou, A., Sarry, F. & Djouadi, M. A. (2009) Isolated acoustic wave based on AlN/ZnO/diamond structure for sensor applications. 2009 Joint Meeting of the European Frequency and Time Forum and the Ieee International Frequency Control Symposium, Vols 1 and 2 New York. |
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| Le Dain, G., Rhallabi, A., Fernandez, M. C., Boufnichel, M. & Roqueta, F. (2017) Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process. Journal of Vacuum Science & Technology A, 35 03E113. |
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| Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109. |
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| Le Dain, G., Rhallabi, A., Girard, A., Cardinaud, C., Roqueta, F. & Boufnichel, M. (2019) Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties. Plasma Sources Science & Technology, 28 085002. |
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| Lebreton, A., Besland, M.-P., Jouan, P.-Y., Signe, T., Mannequin, C., Richard-Plouet, M., Le Granvalet, M., Lethien, C., Brousse, T. & Barbe, J. (2024) Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 42 023405. |
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| Lecuyer, P., Fremont, H., Landesman, J. .-P. & Bahi, M. .-A. (2010) Wearout estimation using the Robustness Validation methodology for components in 150 degrees C ambient automotive applications. Microelectron. Reliab. 50 1744–1749. |
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| Li, D., Dai, S., Li, J., Zhang, C., Richard-Plouet, M., Goullet, A. & Granier, A. (2018) Microstructure and Photocatalytic Properties of TiO2-Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method. J. Electron. Mater. 47 7372–7379. |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229. |
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